Dual-target Magnetron Coating System

Model: YM-MSH300-II-DCRF-SS
Introduction:
The dual target magnetron sputtering coater is a laboratory specific coater developed by our company. The equipment can be equipped with a DC power supply and an RF power supply, with power ranging from 500W to 1000W. Compared with ordinary plasma sputtering, magnetron sput tering has the advantages of high energy and high speed, high coating rate, and low sample temperature rise. It is a typical high speed and low temperature sputtering. The magnetron target is equipped with a water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. The equipment has been compactly designed to achieve a balance between volume and performance, with beautiful ap p earance and comprehensive functions. The whole machine is controlled by a touch screen, with a builtin one-button coa ting program, which is simple and easy to operate. It is an ideal equipment for preparing thin films in the laboratory.
Specifications:
